Intel outfits Arizona's Fab 62 with manufacturing equipment while advancing Ohio construction

Intel has started installing production equipment at Fab 62, its upcoming facility at the Ocotillo campus in Arizona, targeting operational status before the end of 2028. The company also announced progress at its Ohio One manufacturing complex, where workers installed the site's first major structural truss. In addition, Intel confirmed that it has incorporated High-NA EUV lithography scanners at its D1X facility in Oregon into mass production for Panther Lake processor tiles. [1][2]

While Intel originally planned Fab 62 around nodes like Intel 20A and 18A, the chipmaker has not officially assigned specific process nodes, wafer capacity, or final expenditure figures to the plant. However, based on the company's roadmap, Fab 62 could accommodate 18A, 18A-P, or next-generation 14A manufacturing alongside the neighboring Fab 52. The High-NA EUV tools in Oregon currently create circuits comparable to Low-NA machines as Intel learns the technology. [1]

The operational updates arrive as Intel pitches its domestic semiconductor footprint against competitors like TSMC and Samsung. Intel recently broke ground on a Santa Clara photomask facility and emphasized that its domestic ecosystem spans packaging in New Mexico, over 4,500 American suppliers, and more than $29 billion in annual U.S. spending. [1]